IEC TS 62607-9-1:2021

Nanomanufacturing - Key control characteristics - Part 9-1: Traceable spatially resolved nano-scale stray magnetic field measurements - Magnetic force microscopy

IEC TS 62607-9-1:2021

Name:IEC TS 62607-9-1:2021   Standard name:Nanomanufacturing - Key control characteristics - Part 9-1: Traceable spatially resolved nano-scale stray magnetic field measurements - Magnetic force microscopy
Standard number:IEC TS 62607-9-1:2021   language:English language
Release Date:13-Oct-2021   technical committee:TC 113 - Nanotechnology for electrotechnical products and systems
Drafting committee:PT 62607-9-1 - TC 113/PT 62607-9-1   ICS number:07.120 - Nanotechnologies

IEC TS 62607-9-1
Edition 1.0 2021-10
TECHNICAL
SPECIFICATION
colour
inside
Nanomanufacturing – Key control characteristics –
Part 9-1: Traceable spatially resolved nano-scale stray magnetic field
measurements – Magnetic force microscopy




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IEC TS 62607-9-1
Edition 1.0 2021-10
TECHNICAL
SPECIFICATION
colour
inside
Nanomanufacturing – Key control characteristics –

Part 9-1: Traceable spatially resolved nano-scale stray magnetic field

measurements – Magnetic force microscopy

INTERNATIONAL
ELECTROTECHNICAL
COMMISSION
ICS 07.120 ISBN 978-2-8322-1032-9

– 2 – IEC TS 62607-9-1:2021 © IEC 2021
CONTENTS
FOREWORD . 5
INTRODUCTION . 7
1 Scope . 9
2 Normative references . 9
3 Terms and definitions . 9
3.1 General terms . 9
3.2 General terms related to magnetic stray field characterization . 10
3.3 Terms related to the measurement method described in this document . 11
3.4 Key control characteristics measured according to this document . 16
3.5 Symbols and abbreviated terms . 17
4 General . 18
4.1 Measurement principle, general . 18
4.2 Application to scanning systems, discretization . 20
4.3 Preparation of the measurement setup . 20
4.4 Measurement principle, MFM . 20
4.4.1 General . 20
4.4.2 Field detection process . 21
LCF
4.4.3 Lever correction function F . 21
4.4.4 Effective magnetic charge density of the tip . 23
ICF
4.4.5 Characteristics of the MFM F . 23
4.4.6 Concept of calibration by deconvolution . 24
4.4.7 Regularized deconvolution approach . 25
4.5 MFM setup key control characteristics . 26
4.5.1 General . 26
4.5.2 Cantilever spring constant C . 27
4.5.3 Cantilever resonance quality factor Q . 28
4.5.4 Sensitivity of the detection and analysis electronics . 28
4.5.5 Measurement height . 29
4.5.6 Scan size, pixel resolution . 29
4.5.7 Canting angle of the cantilever in the setup . 29
4.5.8 Magnetization orientation of the tip . 29
4.5.9 Regularized deconvolution . 30
4.6 Ambient conditions during measurement . 30
4.7 Reference samples . 30
4.7.1 General . 30
4.7.2 "Well-known" and calculable reference sample . 30
4.7.3 Band domain patterns as self-referencing calibration samples . 30
4.7.4 Detailed stray field calculation procedure for perpendicularly
magnetized band domain reference samples . 31
5 Measurement procedure for calibrated magnetic field measurements . 34
5.1 Calibrated stray field measurement of a sample under test . 34
5.2 Detailed description of the measurement and calibration procedure . 35
5.3 Measurement protocol . 35
5.4 Measurement reliability . 37
5.4.1 Artefacts in MFM measurements . 37
5.4.2 Artefacts resulting from strong stray field samples . 37

5.4.3 Artefacts when measuring samples with low coercivity . 38
5.4.4 Distortion of the domain structure . 38
5.4.5 Contingency strategy . 39
5.4.6 Strategies to improve the quality of the measurements . 39
5.5 Uncertainty evaluation . 39
5.5.1 General . 39
5.5.2 Reference sample . 39
5.5.3 ICF determination . 40
5.5.4 Calibrated field measurement . 40
6 Data analysis / interpretation of results . 41
6.1 Software for data analysis . 41
7 Results to be reported . 43
7.1 General . 43
7.2 Product / sample identification . 43
7.3 Test conditions . 43
7.4 Measurement set-up specific information . 43
7.5 Test results . 44
8 Validity assessment . 44
8.1 General aspects . 44
8.2 Requirements . 45
8.3 Example. 45
ICF
8.3.1 Determination of the Instrument Calibration Function F . 45
8.3.2 Calibrated measurement . 47
Annex A (informative) Algorithm . 49
A.1 Mathematical basics . 49
A.1.1 Continuous Fourier transform versus discrete Fourier Transform . 49
A.1.2 Partial (two-dimensional) Fourier space . 49
A.1.3 Cross correlation theorem . 49
A.2 Magnetic fields in partial Fourier space . 50
A.2.1 Differentiation in partial Fourier space . 50
A.2.2 Magnetic fields in partial Fourier space . 50
A.3 Signal generation in magnetic force microscopy . 50
A.3.1 General . 50
A.3.2 MFM phase shift signal . 51
A.3.3 L-curve criterion for pseudo-Wiener filter-based deconvolution process . 52
Annex B (informative) Uncertainty evaluation . 54
B.1 Definition for instrument calibration . 54
B.2 Definition for calibrated field measurement . 54
B.3 A type uncertainty evaluation . 55
B.4 B type uncertainty evaluation . 55
B.4.1 General . 55
B.4.2 Propagation of uncertainty from the real to the Fourier domain . 55
B.4.3 Propagation of uncertainty from the Fourier to the real space domain . 56
B.4.4 Uncertainty propagation based on the Wiener filter . 57
B.4.5 Uncertainty evaluation for the tip calibration . 59
B.4.6 Uncertainty evaluation for the stray field evaluation . 60
B.5 Monte Carlo technique . 61
Bibliography . 62

– 4 – IEC TS 62607-9-1:2021 © IEC 2021

Figure 1 – Spatial resolution of magnetic stray field characterization techniques and
their possible maximum scan area . 8
Figure 2 – Field measurement with finite-size sensors . 19
Figure 3 – Schematic MFM setup . 20
LCF
Figure 4 – Lever correction function (F ) in Fourier space .
...

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