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Standard
ISO 5618-2
First edition
Fine ceramics (advanced ceramics,
2024-04
advanced technical ceramics) —
Test method for GaN crystal surface
defects —
Part 2:
Method for determining etch pit
density
Céramiques techniques — Méthode d’essai pour les défauts de
surface des cristaux de GaN —
Partie 2: Méthode de détermination de la densité des piqûres
Reference number
ISO 5618-2:2024(en) © ISO 2024
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ISO 5618-2:2024(en)
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© ISO 2024
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Published in Switzerland
© ISO 2024 – All rights reserved
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ISO 5618-2:2024(en)
Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Principle . 3
5 Definition of substrate in-plane position . 3
6 Procedures for forming an etch pit . 3
6.1 Pre-treatment of a sample .3
6.2 Etching process .4
6.3 Washing .4
7 Method of capturing an etch pit image . . 5
7.1 Setting the observation conditions for an optical microscope .5
7.1.1 Objective lens .5
7.1.2 Image resolution .5
7.1.3 Measurement area .6
7.1.4 Measurement points .6
7.2 Capturing an etch pit image by using an optical microscope .
...